Products
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
  • Wafer Backside Grinder/wafer thinning machine
Wafer Backside Grinder/wafer thinning machine

This is a High-efficiency grinder/polisher for wafers. 

What can the High Precision Backside Wafer Thinning Machine do?

It can grind third generation semiconductor materials such as SiC, GaN,GaAs,.Si,ZnO.

This is a self-made grinding machine in China, and its performance has reached the world standard.

Product Details
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what does it consist of

1.DL-ES55 Series Hydrostatic air-floating electric spindle.

Advantages: Air bearing has high rigidity, low vibration, low thermal expansion and small speed change.

Air-floating electric spindle adopts rigid microporous material as the air flotation block, and the spindle accuracy, life, air permeability and stability are in the forefront of the world spindle products.
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2.Manipulator
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3.Hydrostatic air bearing work turntable
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4.NCGNon Contact Gauge

advantage:

Non-contact, reduce fragmentation rate

More accurate, can measure wafer thickness after de-adhesive

Spec: Accuracy ≤ μm

Repeatability 0.1 μm
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Easy operation

Equipped with a touch-type liquid crystal display and GUI (Graphical User Interface) to improve the convenience of operation. The control screen can simultaneously display the processing status and equipment status.

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How it works?

1.Place the wafer cassette on the material table, and the material table automatically calibrates the wafer cassette.
2
.The manipulator grabs the wafer from the wafer cassette and transfers it to the wafer guiding stage; the guiding stage positions and guides the wafer.

3.The main turntable rotates to station A for grinding, NCG detects the wafer thickness and automatically compensates the feed amount.

4.The main turntable rotates to station B for polishing, and NCG detects the wafer thickness and automatically compensates the feed amount.

5.The main turntable rotates to station C for cleaning and drying.

6.Robot returns the cleaned wafer to the wafer cassette.
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Specifications for Fully Automatic Wafer Grinder

SpecificationDetailed SpecificationUnitTY-6/8BGDTY-8/12BGD
Wafer DiameterWafer Diameterinch4”, 6”8”, 12”
Grinding MethodGrinding Method-In-feed grinding with wafer RotationIn-feed grinding with wafer Rotation
Grinding WheelsGrinding WheelsmmDiamond wheel (grinding-axis)Polishing pad(CMP pad)Diamond wheel (grinding-axis)Polishing pad(CMP pad)
Grinding-axisRated PowerKW~45.5

Rated Speedr/min1000~60001000~4000
PrecisionFlatnessμm≤2< 3

RoughnessμmRy 0.13 (with #2000 finish)Ry 0.15 (with #1400 finish)Ry 0.13 (with #2000 finish)Ry 0.15 (with #1400 finish)
Machine Dimensions (W×D×H)Machine Dimensions (W×D×H)mm2500×4500×18002500×4500×1800
WeightWeightKGApprox. 4000KGApprox. 5000KG

 


Inquiry
Contact Us
Contact person: Grace
Phone: +86 13622378685
Email: Grace@lapping-machine.com
Address:Building 34, Zone B, Yuanshan Industrial Zone, Xiangcheng Road, Guangming District, Shenzhen,China

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Shenzhen Tengyu Grinding Technology Co., Ltd.