Reactive Plasma Deposition System
The RPD series is a reactive plasma deposition system and can mass-produce high performance, functional LED films (ITO and AlN) at low cost.
FEATURES:
1. Realizing both activation and evaporation of deposition materials by employing a reactive plasma source.
2. High quality crystalline film by applying optimum energy.
3. Mass-production at low temperature and low cost.
+8613622378685
WeChat
YouTube
Specifications of RPD-1011
|
Chamber Size |
1000 mm × H1165 mm |
|
Substrate Dome |
φ 870 mm |
|
Max. Dome Rotation Speed |
10 - 30 rpm |
|
Crystal Flim Thicness Monitor |
6 point rotary sensor |
|
Ion Source |
Reactive Plasma Source |
|
Performance |
|
|
Ultimate Pressure |
1.0E-4 Pa or lower |
|
Pumping Speed |
20 min (from atmospheric pressure to 1.3 × 10-3 Pa） |
|
Utility Requirements |
|
|
Footprint |
4000 mm (W) × 6000 mm (D) × 2800 mm (H) approx. |
|
Power Supply |
3-phase, 200 V ± 5%, 75 kVA, approx. |
|
Minimum Water Flow |
80 Q /min or greater |
|
Air Pressure |
0.5 MPa - 0.7 MPa |
|
Weight |
4000 kg approx. |
Scan WeChat
English
русский
한국어
Deutsch
español
italiano
العَرَبِيَّة